Stress-Free Metallic Films For Next-Gen Circuits

Researchers developed stress-free metallic films which decrease the microscopic defects and improve the performance of semiconductor devices. Modern micro and nano-electronic devices’ performance is dictated by the impurities and the defect in the nanoscale metallic films. To make the overall behavior of a  device predictable, nanoscale deposition onto the surfaces must be improved, but it […]

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